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Structured free-water clusters near lubricating surfaces are essential in water-based lubrication

机译:润滑表面附近的结构化自由水团簇对于水基润滑至关重要

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摘要

Water-based lubrication provides cheap and environmentally friendly lubrication and, although hydrophilic surfaces are preferred in water-based lubrication, often lubricating surfaces do not retain water molecules during shear. We show here that hydrophilic (42° water contact angle) quartz surfaces facilitate water-based lubrication to the same extent as more hydrophobic Si crystal surfaces (61°), while lubrication by hydrophilic Ge crystal surfaces (44°) is best. Thus surface hydrophilicity is not sufficient for water-based lubrication. Surface-thermodynamic analyses demonstrated that all surfaces, regardless of their water-based lubrication, were predominantly electron donating, implying water binding with their hydrogen groups. X-ray photoelectron spectroscopy showed that Ge crystal surfaces providing optimal lubrication consisted of a mixture of -O and =O functionalities, while Si crystal and quartz surfaces solely possessed -O functionalities. Comparison of infrared absorption bands of the crystals in water indicated fewer bound-water layers on hydrophilic Ge than on hydrophobic Si crystal surfaces, while absorption bands for free water on the Ge crystal surface indicated a much more pronounced presence of structured, free-water clusters near the Ge crystal than near Si crystal surfaces. Accordingly, we conclude that the presence of structured, free-water clusters is essential for water-based lubrication. The prevalence of structured water clusters can be regulated by adjusting the ratio between surface electron-donating and electron-accepting groups and between -O and =O functionalities.
机译:水基润滑可提供廉价且对环境友好的润滑,尽管亲水性表面在水基润滑中更可取,但通常润滑表面在剪切过程中不会保留水分子。我们在此表明​​,亲水性(42°水接触角)石英表面与更多的疏水性Si晶体表面(61°)具有相同程度的水基润滑,而亲水性Ge晶体表面(44°)的润滑效果最佳。因此,表面亲水性不足以进行水基润滑。表面热力学分析表明,所有表面,无论其基于水的润滑如何,都主要是给电子体,这意味着水与其氢基结合。 X射线光电子能谱表明,提供最佳润滑的Ge晶体表面由-O和= O官能度的混合物组成,而Si晶体和石英表面仅具有-O官能度。水中晶体的红外吸收带的比较表明,亲水性Ge上的结合水层比疏水性Si晶体表面上的少,而Ge晶体表面上的自由水的吸收带表明,结构化的自由水团簇的存在更为明显。靠近锗晶体比靠近硅晶体表面。因此,我们得出结论,结构化的自由水团簇的存在对于水基润滑至关重要。可以通过调节表面给电子基团和电子接受基团之间的比率以及-O和= O官能团之间的比率来调节结构化水团簇的发生率。

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